JPS6148252B2 - - Google Patents
Info
- Publication number
- JPS6148252B2 JPS6148252B2 JP56079389A JP7938981A JPS6148252B2 JP S6148252 B2 JPS6148252 B2 JP S6148252B2 JP 56079389 A JP56079389 A JP 56079389A JP 7938981 A JP7938981 A JP 7938981A JP S6148252 B2 JPS6148252 B2 JP S6148252B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- photomask substrate
- view
- field
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 8
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57194530A JPS57194530A (en) | 1982-11-30 |
| JPS6148252B2 true JPS6148252B2 (en]) | 1986-10-23 |
Family
ID=13688501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56079389A Granted JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57194530A (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3796089B2 (ja) * | 2000-02-14 | 2006-07-12 | 新光電気工業株式会社 | 薄板の位置決め装置 |
-
1981
- 1981-05-27 JP JP56079389A patent/JPS57194530A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57194530A (en) | 1982-11-30 |
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